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IGZO TFT versus the MOSFET

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dc.contributor.author Matebesi, Unopa
dc.contributor.author Mogosetso, Gofaone
dc.contributor.author Lebekwe, Caspar K.
dc.contributor.author Ditshego, Nonofo M.J
dc.contributor.author Khoo, W.H
dc.contributor.author Sultan, Suhana Mohamed
dc.date.accessioned 2020-08-17T09:57:56Z
dc.date.available 2020-08-17T09:57:56Z
dc.date.issued 2019-06
dc.identifier.citation Matebesi, U. et al. (2019) IGZO TFT versus the MOSFET. In Jamisola, Rodrigo S. Jr (ed.) BIUST Research and Innovation Symposium 2019 (RDAIS 2019); 1 (1) 54-58. en_US
dc.identifier.issn 2521-2292
dc.identifier.uri http://repository.biust.ac.bw/handle/123456789/155
dc.description.abstract Indium gallium zinc oxide thin film transistor (IGZO TFT) characteristics are investigated, improved and then compared with the standard metal-oxide semiconductor field effect transistor (MOSFET). The device tends to operate with a negative threshold voltage which is undesirable as it means the device is ‘ON’ at 0.0 V. For the device to be an effective CPU switch, it needs to operate with voltage values between 0.0 V and 5.0 V where the lower value means it is completely ‘OFF’ with no leakage currents. Negative fixed charge was introduced to help turn the device ‘OFF’ whereas the MOSFET had negligible values. The TFT was driven at a drain voltage of 1.0 V whereas the MOSFET was at 0.1 V. This made the two devices comparable with similar threshold voltage of 0.6 V and an ideal subthreshold swing of 60 mV/decade. The experiment shows that the subthreshold voltage for the IGZO TFT is excellent at lower drain currents but degrades at higher currents. The quick degradation observed on the subthreshold region can also be attributed to short channel effects (SCEs). en_US
dc.description.sponsorship Botswana International University of Science and Technology en_US
dc.language.iso en en_US
dc.publisher Botswana International University of Science and Technology en_US
dc.subject Indium Gallium Zinc Oxide Thin Film Transistor (IGZO TFT) en_US
dc.subject Metal Oxide Semiconductor Field Effect Transistor (MOSFET) en_US
dc.subject Scaling en_US
dc.subject Short Channel Effects (SCE) en_US
dc.title IGZO TFT versus the MOSFET en_US
dc.description.level phd en_US
dc.description.accessibility unrestricted en_US
dc.description.department cte en_US


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